Multitarget Sputtering Tool (200 mm)

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Singulus, Timaris - The Multi-target physical vapor deposition cluster tool is especially designed for deposition of ultra–thin films, magnetic films, high–quality metallic, conductive and insulating films and multiple film stack deposition comprising these materials without the need to break ultra-high vacuum. The system is a UHV single wafer cluster tool and consists of one transport module, one multi-target PVD module and one soft etch/ oxidation module. It is capable of depositing different magnetic and non–magnetic layers on wafers with diameters up to 200mm by DC/RF Magnetron Sputtering (or Ion Beam Sputtering), with good uniformity for the deposited stacks.

Available for external use

Associated technology




Ricardo Ferreira Contact with Ricardo Ferreira