Equipment

CNT Deposition Tool (PECVD, 800C)

08-cvd_for_carbon_nanotubes_equipment Ampliar

Description

Roth and Rau Microsystems, MicroSys 400 - A dedicated CVD equipment for carbon nanotube growth on wafers with process flexibility to grow various aspect ratios for applications such as field emission sources, bio sensors and microfluidics among others.This Nanoscale Growth System delivers high performance growth of nanotubes and nanowires with in-situ catalyst activation and rigorous process control with flexible temperature up to 700°C.

Available for external use

Associated technology

Location

Cleanroom

Contact.

Helder Fonseca Contact with Helder Fonseca