Equipment

Multitarget Confocal Sputtering Tool

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Description

Kenosystec - A multi-target UHV sputtering system consisting of a deposition chamber with 11 2” diameter magnetrons in confocal geometry for the co-deposition of materials, optimized wafers of up to 200m in diameter.

Available for external use

Associated technology

Location

Cleanroom

Contact.

Ricardo Ferreira Contact with Ricardo Ferreira