Equipment

Electron Beam Lithography

01_-_electron_beam_lithography_equipment Ampliar

Description

Vistec 5200 ES 100 kV - The electron-beam lithography system is designed for high resolution fabrication and placement of patterns written directly on substrates up to 200mm. The system is also very capable of writing optical masks for contact and projection lithography. It allows exposure of structures with minimum dimensions below 10nm, on Si and other substrates (glass, SiO2) with High current density Thermal Field Emission gun for operation at 20, 50 and 100 kV.

Available for external use

Associated technology

Location

Cleanroom

Contact.

Jérôme Borme Contact with Jérôme Borme