Equipment

Photoresist tracks

04_-_coater_developer_tracks_b__equipment Ampliar

Description

Karl Suss Gamma Cluster - The cluster tracks enable automatic spin coating and develop process of up to 200 mm wafers for multi-layer and thick resist coating. There are two separate tracks, one for optical resist and a second one for electronbeam resists. Both systems include a submicron Coater module with pivoting dispense arm, top and bottom EBR, puddle and spray development chamber, programmable exhaust flow controller, temperature controlled lines, and drain full sensor. These systems are capable of processing up to 25 wafers in one batch.

Available for external use

Associated technology

Location

Cleanroom

Contact.

Margaret Costa Contact with Margaret Costa