Equipment

Molecular beam epitaxy system for Cu(In,Ga)Se2 materials

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Description

The Omicron EVO 50 is a molecular beam epitaxy system for evaporation from up to 9 sources onto a 2 inch wafer. The system is equipped with elemental evaporation sources for Cu, In, and Se. It is coupled to the UHV-SPM system (Omicron VT-AFM XA 50/500), such that samples can be characterized by SPM without contact to air. Substrate heating (up to 1200ºC) and rotation are implemented for improved homogeneity and a quartz crystal balance is available for calibration of evaporation rates.

Available for external use