Published 11-05-2012
Their Royal Highnesses the Princes of Asturias, Felipe de Borbón y Grécia, and Letizia Ortiz Rocasolano will visit the International Iberian Nanotechnology Laboratory on the 31st of May. The visit is part of the official tour of the Royal Couple to the Republic of Portugal, from May 30th to June 1st.
Published 10-05-2012
More than 160 students applied for an opportunity to work closely with INL researchers. Starting late June, the second edition of INL summer courses will offer 20 students from Portugal and Spain hands-on training in advanced research projects with INL scientists for two months. Scholars will have the opportunity of sharing the initial research steps of an international and multidisciplinary community working on nanotechnology projects, formed by scientists and engineers from all over the world.
All candidates will be informed before the end of May about the outcome of their scholarship application.
Published 16-02-2012
The Director General of the International Iberian Nanotechnology Laboratory (INL), José Rivas, was pleased with the interest shown by the Finish academic and industrial institutions visited during the stay organized by the President of the Republic of Portugal, Aníbal Cavaco Silva, to Helsinki, last week. Erkki Ormala, Vice-President for Business Environment at Nokia, one of the world leaders in communication technologies, showed interest in visiting the International Iberian Nanotechnology Laboratory, with its headquarters in Braga. The future visit of Nokia representatives will allow establish...
Published 25-05-2011
Advanced Silicon Etch (ASE) is a deep reactive ion etching (DRIE) technique used to rapidly etch deep and high aspect ratio structures in silicon.
LPX Pegasus is the continuation of STS’ Advanced Silicon Etch (ASE) technology. Through an in-depth understanding of the Bosch process and with the required hardware, Pegasus is able to provide excellent profile control and selectivity. The increased etch rate and improved uniformity lead to higher throughput and device yield, resulting in increased productivity.
This inductively de-coupled plasma (IDP) system uses fluorine-based gases for an...
