INL accelerates the development of applications with a new nanoimprint system

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INL – International Iberian Nanotechnology Laboratory has purchased an Eitre 8 NIL nanoimprint system from Obducat, a leading supplier of lithography solutions based on nanoimprint lithography (NIL). This investment reinforces INL high-end equipment portfolio and consequently its ability to provide better and faster outcomes.

This nanoimprint system will be installed in the INL clean room facilities. With its high-throughput and high yield capabilities of replicating nanostructures at the 200 mm wafer scale, this lithography system will allow to significantly reduce process and development times for INL and its partners. It will be used for a broad range of applications, covering fields in optics, nanosensors and surfaces with very special functions, to name a few.

The EITRE system is scheduled to be delivered to INL during the fourth quarter this year.