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Pedro

More about Pedro Alpuim

Pedro Alpuim

Associated Researcher

Résumé

P. Alpuim has a Master in Physics from the University of Minho (UM, 1995), and a Ph.D. in Materials Engineering from the Technical University of Lisbon (IST, 2003) where he worked in silicon thin-film devices deposited on plastic substrates. Since then he has been with the department of Physics of UM as an assistant professor, where he installed a new lab for thin-film electronic materials deposition and device characterization. He worked in piezoresistive strain sensing devices, flexible solar cells, thermoelectric energy scavenging and thin-film transistors. Since 2011 he is an associate researcher at INL where he continues to work in thin-film devices and began research in graphene CVD deposition and device fabrication for biosensing applications. P. Alpuim has been a visiting scientist at ipv-Uni-Stuttgart, IMTEK-Uni-Freiburg, and LPICM, Ecole Polytechnique, Palaiseau.

Selected recent publications:

S. Majee, M.F. Cerqueira, D. Tondelier, B. Geffroy, Y. Bonnassieux, P. Alpuim, J.E. Bourée, The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers, Surf. & Coatings Technology in press (Available online 3 August 2013)

F. Gontad, J.C. Conde, S. Filonovich, M.F. Cerqueira, P. Alpuim, S. Chiussi, Study on excimer laser irradiation for controlled dehydrogenation and crystallization of boron doped hydrogenated amorphous/nanocrystalline silicon multilayers, Thin Solid Films 536, 147 (2013)

P. Alpuim, J. Gaspar, P. Gieschke, C. Ehling, J. Kistner, N. J. Gonçalves, M. I. Vasilevskiy, O. Paul, Study of the piezoresistivity of doped nanocrystalline silicon thin films, J. Appl. Phys. 109 (12) 123717 (2011)

L.M. Gonçalves, C. Couto, P. Alpuim, A.G. Rolo, F. Völklein, J.H. Correia, Optimization of thermoelectric properties on Bi2Te3 thin films deposited by thermal co-evaporation, Thin Solid Films 518 (10) 2816 (2010)

S.A. Filonovich, P. Alpuim, L. Rebouta, J.-E. Bourée, Y. M. Soro, Amorphous and nanocrystalline silicon solar cells deposited by HWCVD and rf-PECVD on plastic substrates at 150ºC, Journal of Non-Crystalline Solids 354 (19-25) 2376 (2008)