The Microfabrication and Exploratory Nanotechnology (MeN) group is dedicated to fabrication processes for internal and external users in the areas of: MEMS and NEMS, spintronics, microfluidics, graphene and thin film semiconductors, energy storage, conversion and optical devices, lithography and advanced packaging; also, acting as a facility and expertise group providing support for all cleanroom users, multi project wafer runs (MEMS, spintronics, polyimide, …), rapid prototyping and integration.

Aligned with INL’s strategy, vision, and mission, the microfabrication and exploratory nanotechnology group bases its activities in 3 main actions pillars:

1. Continuous technology development and integration as a way of obtaining added functionalities in a single device, surface or system, as well as procuring new functionalities that are unattainable from each individual technology: this includes merging bottom-up techniques with top-down processes as well.

Some of the work developed for our 2016 portfolio includes:

• Integration of existing magnetic and microelectromechanical systems (MEMS)

• Flexible and stretchable devices

• Through Silicon Vias (TSVs) used in IC power electronics

• Multi-microchannel heat sinks for electronics’ cooling

• Micro-machined Si molds

• Polymeric microneedles for transdermal drug delivery

• AFM tips with sensors for high resolution magnetic imaging of material surfaces

• Si needles with sensors for neuronal magnetic field measurements

• Materials for piezoelectric, semiconductor, photonic and thermoelectric applications.

• Further development in technologies including graphene, photonics, microfluidics, advanced 3D packaging and post-CMOS processes.

2. Miniaturization and throughput – New physical principles and phenomena are enabled by the miniaturization of devices and systems, ranging from the micro- to the nano-scale, done by improving existing technologies and exploring new innovative functionalities.

A strong drive for size reduction along with improved methods for processing nanoscale features enables high fabrication throughput with scalable processes, leading to cost reduction and fast deployment of application-based nano-devices.

This includes:

• Converting MEMS into nanoelectromechanical systems (NEMS)

• Processing of sub-µm magnetic sensors by means of advanced lithography, deposition and etching processes

• Improved patterning methods for sub-µm GaAs photonic resonators used in infr

• Photonic crystal nanocavities for optical filters used in biosensing applications

• Sub-100-nm gratings for optical polarizers (a collaboration with a nanoimprint lithography tool supplier)

3. Excellence in cleanroom facility Management, Services, Quality and Networking –
Our continuous improvement in all our activities includes:

• INL’s cleanroom user interface and laboratory information management system (LIMS) as a key enabler for the management of the booking/logging of process tools, resource planning and cost and usage analysis, all centralized by a web-based software.

• Pursuit for an ISO 9001 certification for the services provided by the MeN group. In the future, other quality certifications are foreseen in order to ease the deployment of nanodevices to the automotive, space, medical and other industries.

• The MeN group is currently driving the creation of a national nanofabrication infrastructure to be extended to the Iberian Peninsula during 2017-2018 and, in the long term, it targets to be an active partner on both infrastructure and training international networks in the nanofabrication arena. Several visits to and from INL took place during 2016 with discussions between strategic partners at the national (CEMUP/MNTEC, CENIMAT/I3N, INESC MN), Iberian (CNM-CSIC, several members of the Spanish Network of Nanolithography) and European (several members of the Nordic Nanofabrication Network) levels. During 2016, INL has also contributed to the COST proposal “NanoLabs4Europe” together with KIT, NanolabNL, Norfab, Myfab, Renatech, among others.

RESEARCH