Nanosciences and Nanotechnologies (N&N) are new approaches to research and development that concern the study of phenomena and manipulation of materials at atomic, molecular and macromolecular scales, where properties differ significantly from those at a larger scale.
Nanoscience and Nanotechnology is the understanding and control of matter at dimensions of roughly 1 to 100 nanometers, where unique phenomena enable novel applications. Encompassing nanoscale science, engineering and technology, nanotechnology involves imaging, measuring, modeling, and manipulating matter at this length scale. Nanotechnology R&D is directed toward understanding and creating improved materials, devices, and systems that exploit these new properties.
Published 16-02-2012
The Director General of the International Iberian Nanotechnology Laboratory (INL), José Rivas, was pleased with the interest shown by the Finish academic and industrial institutions visited during the stay organized by the President of the Republic of Portugal, Aníbal Cavaco Silva, to Helsinki, last week. Erkki Ormala, Vice-President for Business Environment at Nokia, one of the world leaders in communication technologies, showed interest in visiting the International Iberian Nanotechnology Laboratory, with its headquarters in Braga. The future visit of Nokia representatives will allow establishing collaborations in strategic areas like electronic devices and sensors.
INL also visited Micronova, the Centre for Micro and Nanotechnology Nanofabrication, on the Otaniemi Campus of Aalto University, where the delegation was hosted by Ilkka Niemela, Dean of the School of Science. The Research, Technology and Development activities of the finish nanotechnology cluster were made known through several presentations. From these presentations, Prof. Rivas concluded that there are groups of excellence working on nanomedicine and materials research. «The academic quality is remarkable and the way research and industry are connected in an example to be considered», said José Rivas. One of the strategic goals of INL is to stand out as a scientific organization of excellence, with an important role in the fields of applied research.
The presentation delivered by José Rivas on INL, explaining its activities, world-class infrastructure and state-of-the-art equipment, opened new avenues for future academic and industrial collaboration in the area of nanotechnology.
This stay also included a visit to Picosun, a company specialized in nanotechnology equipment, especially ALD, Atomic Layer Deposition and thin films. The company is strongly oriented towards integrating research in product de...
Published 09-01-2012
As part of a collaboration with the Massachusetts Institute of Technology (MIT), the International Iberian Nanotechnology (INL)is currently seeking candidates for two Group Leader positions. The first position will focus on research in the area of biological approaches to templated self-assembly and nanopatterning. The second position will lead the effort on graphene-based nanoelectronic sensor devices at INL. Deadline is March 9th, 2012, 23h00 (Lisbon time).
Candidates with outstanding CVs and demonstrated excellence in these scientific topics will be especially considered. INL welcomes applicants with at least 5 years of Postdoctoral experience, or equivalent academic path. Previous industrial laboratory experience will be valued. The work location is Braga (Portugal) but candidates must show availability for temporary relocation between Massachusetts (US) and Braga (Portugal). The start-up package and remuneration scheme is in line with those offered by other International Organizations and according to candidate experience and background. Applicants should forward the application material indicated to the INL directly, with a copy to inl-mit@mtl.mit.edu
Published 25-05-2011
Advanced Silicon Etch (ASE) is a deep reactive ion etching (DRIE) technique used to rapidly etch deep and high aspect ratio structures in silicon.
LPX Pegasus is the continuation of STS’ Advanced Silicon Etch (ASE) technology. Through an in-depth understanding of the Bosch process and with the required hardware, Pegasus is able to provide excellent profile control and selectivity. The increased etch rate and improved uniformity lead to higher throughput and device yield, resulting in increased productivity.
This inductively de-coupled plasma (IDP) system uses fluorine-based gases for anisotropic deep silicon trench etching. The 13.56 MHz RF power supply produces high-density, low-pressure, low-energy plasma. This type of plasma allows high selectivity and aspect ratio etching for depths greater than 150 microns and has an expected etch rate better than 15 microns/ min. Used primarily for MEMs devices, the typical materials used in this etcher are silicon wafers covered with photoresist and thin films of silicon dioxide and silicon nitride.
The performance improvements that Pegasus brings havenumerous benefits for research as well as for end users.
At the moment, the tool is being installed in the INL’s facilities and it is expected that the final validation process will take place the first half of May; consequentially, it will beavailable for both researchers and companies interested in utilizing the technology.
This capability will help us be at the forefront of research in nanotechnology, continue developing new and innovative microdevices for a broad range of challenging applications and research projects.
Published 26-11-2010
In pursue of INL’s outreach program, Jose Rivas, Director General (DG) of the INL, attended the“Simposio: Nanociencias y Nanotecnología” at UAM in Mexico City, 15-16 November and the NanoMex’10 which is the Third International and Interdisciplinary Nanoscience and Nanotechnology Meeting , organized by the National Autonomous University of Mexico (UNAM), in Cuernavaca City (Morelos) 17-19 November . In this meeting the DG of the INL made the most of the encounters to present the INL and to contact leading important Mexican scientists in the field of Nanotechnology .
The goal of NanoMex’10 is to stimulate high-quality interdisciplinary dialogue on the advance, promises and implications of nanoscience and nanotechnology in order to enrich the national decision-making concerning the distribution of benefits, maximization and definition of responsibilities and, the minimization of unnecessary and unwanted costs.
It is an initiative nano-UNAM, a group initially formed by the Centre for Interdisciplinary Research in Sciences and Humanities, the Center for Nanoscience and Nanotechnology, the Center for Applied Sciences and Technological Development and the Environmental Nanotechnology University Program. A partir de 2009, nano-UNAM articula 11 entidades y un programa universitario. Since 2009, nanoUNAM is conformed by 11 UNAM’s entities and a research university program.
Feb 22nd, 2012 - 09:03
The Material Science & Nanotechnology Laboratories at the University of Jordan The material science and nanotechnology laboratories at Hamdi Mango Center for Scientific Research (HMCSR) incubate research in select projects that have the potential to be applied in Jordanian industry. The material science and nanotechnology laboratories are divided into three research groups: (I) The Superconductor
Feb 20th, 2012 - 09:32
Within this section, Nanobugle will test the 3 main key success factors for the development of new nanotechnology/nanoscience companies. This week: Jordan 1) How was the company born? Silicon Valley for Nanotechnology was established in 2008, at a time when they were building strategic companies with global companies and agencies specialized in the field of
