INTEGRATED MICRO AND NANOTECHNOLOGIES (IMiNa) RESEARCH GROUP

Integrated Micro and Nanotechnologies

INTEGRATED MICRO AND NANOTECHNOLOGIES (IMiNa) RESEARCH GROUP

The Integrated Micro and Nanotechnologies (IMiNa) research group is dedicated to fabrication processes for internal and external users in the areas of: MEMS and NEMS, spintronics, microfluidics, graphene and thin film semiconductors, energy storage, conversion and optical devices, lithography and advanced packaging; also, acting as a facility and expertise group providing support for all cleanroom users, multi project wafer runs (MEMS, spintronics, polyimide, …), rapid prototyping and integration.

Aligned with INL’s strategy, vision, and mission, the Integrated Micro and Nanotechnologies (IMiNa) research group bases its activities in 3 main actions pillars:

  1. Continuous technology development and integration
  2. Miniaturization and throughput
  3. Excellence in cleanroom facility Management, Services, Quality and Networking

1. Continuous technology development and integration

Continuous technology development and integration as a way of obtaining added functionalities in a single device, surface or system, as well as procuring new functionalities that are unattainable from each individual technology: this includes merging bottom-up techniques with top-down processes as well.
Some of the work developed for our 2016 portfolio includes:

  • Integration of existing magnetic and microelectromechanical systems (MEMS)
  • Flexible and stretchable devices
  • Through Silicon Vias (TSVs) used in IC power electronics
  • Multi-microchannel heat sinks for electronics’ cooling
  • Micro-machined Si molds
  • Polymeric microneedles for transdermal drug delivery
  • AFM tips with sensors for high resolution magnetic imaging of material surfaces
  • Si needles with sensors for neuronal magnetic field measurements
  • Materials for piezoelectric, semiconductor, photonic and thermoelectric applications.
  • Further development in technologies including graphene, photonics, microfluidics, advanced 3D packaging and post-CMOS processes.

MG_2820_8

2. Miniaturization and throughput

New physical principles and phenomena are enabled by the miniaturization of devices and systems, ranging from the micro- to the nano-scale, done by improving existing technologies and exploring new innovative functionalities.
A strong drive for size reduction along with improved methods for processing nanoscale features enables high fabrication throughput with scalable processes, leading to cost reduction and fast deployment of application-based nano-devices.

This includes:

  • Converting MEMS into nanoelectromechanical systems (NEMS)
  • Processing of sub-µm magnetic sensors by means of advanced lithography, deposition and etching processes
  • Improved patterning methods for sub-µm GaAs photonic resonators used in infr
  • Photonic crystal nanocavities for optical filters used in biosensing applications
  • Sub-100-nm gratings for optical polarizers (a collaboration with a nanoimprint lithography tool supplier)

IMG_3100_8

3. Excellence in cleanroom facility Management, Services, Quality and Networking

Our continuous improvement in all our activities includes:

  • INL’s cleanroom user interface and laboratory information management system (LIMS) as a key enabler for the management of the booking/logging of process tools, resource planning and cost and usage analysis, all centralized by a web-based software.
  • Pursuit for an ISO 9001 certification for the services provided by the MeN group. In the future, other quality certifications are foreseen in order to ease the deployment of nanodevices to the automotive, space, medical and other industries.
  • The MeN group is currently driving the creation of a national nanofabrication infrastructure to be extended to the Iberian Peninsula during 2017-2018 and, in the long term, it targets to be an active partner on both infrastructure and training international networks in the nanofabrication arena.

Visits and discussions between INL and strategic partners at the national (CEMUP/MNTEC, CENIMAT/I3N, INESC MN), Iberian (CNM-CSIC, several members of the Spanish Network of Nanolithography) and European (several members of the Nordic Nanofabrication Network) levels are ongoing.

INL has also contributed to the COST proposal “NanoLabs4Europe” together with KIT, NanolabNL, Norfab, Myfab, Renatech, among others.

GROUP LEADER

INL Portraits Lorenzo Pastrana

THE TEAM

Rosana Dias
Staff Researcher

Alar Ainla
Staff Researcher

Vinaya Basavarajappa
Staff Researcher

Diogo Aguiam
Staff Researcher

Filipe Alves
Staff Researcher

Edoardo Sotgiu
Research Engineer

André Cardoso
Research Engineer

Patrícia Sousa
Research Engineer

Stephen Mundy
Research Engineer

Inês Garcia
Research Engineer

Aritz Retolaza
Research Engineer

Stephen Mundy
Research Engineer

Abdelrahman Elhawash
Research Fellow

Pedro Matos
Research Fellow

Pablo Valentim
Research Fellow

Pedro González
Research Fellow

José Queiroz
Research Fellow

Mohammadmahdi Faraji
Research Fellow

João Cunha
Research Fellow

Rui Rocha
Research Fellow

Rui Pinto
Research Fellow

Pulkit Saluja
Research Fellow

INTEGRATED MICRO AND NANOTECHNOLOGIES (IMiNa) RESEARCH GROUP

The Integrated Micro and Nanotechnologies (IMiNa) research group is dedicated to fabrication processes for internal and external users in the areas of: MEMS and NEMS, spintronics, microfluidics, graphene and thin film semiconductors, energy storage, conversion and optical devices, lithography and advanced packaging; also, acting as a facility and expertise group providing support for all cleanroom users, multi project wafer runs (MEMS, spintronics, polyimide, …), rapid prototyping and integration.

Aligned with INL’s strategy, vision, and mission, the Integrated Micro and Nanotechnologies (IMiNa) research group bases its activities in 3 main actions pillars:

  1. Continuous technology development and integration
  2. Miniaturization and throughput
  3. Excellence in cleanroom facility Management, Services, Quality and Networking

1. Continuous technology development and integration

Continuous technology development and integration as a way of obtaining added functionalities in a single device, surface or system, as well as procuring new functionalities that are unattainable from each individual technology: this includes merging bottom-up techniques with top-down processes as well.
Some of the work developed for our 2016 portfolio includes:

  • Integration of existing magnetic and microelectromechanical systems (MEMS)
  • Flexible and stretchable devices
  • Through Silicon Vias (TSVs) used in IC power electronics
  • Multi-microchannel heat sinks for electronics’ cooling
  • Micro-machined Si molds
  • Polymeric microneedles for transdermal drug delivery
  • AFM tips with sensors for high resolution magnetic imaging of material surfaces
  • Si needles with sensors for neuronal magnetic field measurements
  • Materials for piezoelectric, semiconductor, photonic and thermoelectric applications.
  • Further development in technologies including graphene, photonics, microfluidics, advanced 3D packaging and post-CMOS processes.

MG_2820_8

2. Miniaturization and throughput

New physical principles and phenomena are enabled by the miniaturization of devices and systems, ranging from the micro- to the nano-scale, done by improving existing technologies and exploring new innovative functionalities.
A strong drive for size reduction along with improved methods for processing nanoscale features enables high fabrication throughput with scalable processes, leading to cost reduction and fast deployment of application-based nano-devices.

This includes:

  • Converting MEMS into nanoelectromechanical systems (NEMS)
  • Processing of sub-µm magnetic sensors by means of advanced lithography, deposition and etching processes
  • Improved patterning methods for sub-µm GaAs photonic resonators used in infr
  • Photonic crystal nanocavities for optical filters used in biosensing applications
  • Sub-100-nm gratings for optical polarizers (a collaboration with a nanoimprint lithography tool supplier)

IMG_3100_8

3. Excellence in cleanroom facility Management, Services, Quality and Networking

Our continuous improvement in all our activities includes:

  • INL’s cleanroom user interface and laboratory information management system (LIMS) as a key enabler for the management of the booking/logging of process tools, resource planning and cost and usage analysis, all centralized by a web-based software.
  • Pursuit for an ISO 9001 certification for the services provided by the MeN group. In the future, other quality certifications are foreseen in order to ease the deployment of nanodevices to the automotive, space, medical and other industries.
  • The MeN group is currently driving the creation of a national nanofabrication infrastructure to be extended to the Iberian Peninsula during 2017-2018 and, in the long term, it targets to be an active partner on both infrastructure and training international networks in the nanofabrication arena.

Visits and discussions between INL and strategic partners at the national (CEMUP/MNTEC, CENIMAT/I3N, INESC MN), Iberian (CNM-CSIC, several members of the Spanish Network of Nanolithography) and European (several members of the Nordic Nanofabrication Network) levels are ongoing.

INL has also contributed to the COST proposal “NanoLabs4Europe” together with KIT, NanolabNL, Norfab, Myfab, Renatech, among others.

GROUP LEADER

INL Portraits Lorenzo Pastrana

THE TEAM

Jordi Llobet
Staff Researcher

Rosana Dias
Staff Researcher

Alar Ainla
Staff Researcher

Vinaya Basavarajappa
Staff Researcher

Diogo Aguiam
Staff Researcher

Filipe Alves
Staff Researcher

Edoardo Sotgiu
Research Engineer

Marco Martins
Research Engineer

André Cardoso
Research Engineer

Patrícia Sousa
Research Engineer

Stephen Mundy
Research Engineer

Inês Garcia
Research Engineer

Abdelrahman Elhawash
Research Fellow

Pedro Matos
Research Fellow

Pablo Valentim
Research Fellow

Pedro González
Research Fellow

José Queiroz
Research Fellow