Jordi Llobet

Staff Researcher
Microfabrication and Exploratory Nanotechnology 

Jordi Llobet is a researcher of the Microfabrication and Exploratory Nanotechnology group (INL, Portugal). His investigation activities are focused in the areas of nanofabrication and characterization for different applications, from fundamental research to higher TRL. He developed new methods for the fabrication of suspended silicon structures with high potentiality to build different nanoelectronic devices (NEMS, FETs and SETs). He was awarded in 2016 with the Young Investigator Award from SwissLitho and IBM (Zurich). He has been involved in 12 micro/nanofabrication public competitive founded projects and 8 contracts with industry. He is co-author of 40+ scientific peer-reviewed publications and his works have been presented at 80+ conferences.

His is interested in nanofabrication and characterization of novel structures for nanoelectronics and materials science, on biosensing applications and on light trapping architectures to enhance solar absorption.

Selected Publications

  • V. Tzanov, J. Llobet, F. Torres, F Perez-Murano, N Barniol
    Multi-Frequency Resonance Behaviour of a Si Fractal NEMS resonator
    Nanomaterials 10, 811 (2020)
  • A. Prajapati, J. Llobet, M. Antunes, H. Fonseca, C. Calaza, J. Gaspar, G. Shalev
    Opportunities for enhanced omnidirectional broadband absorption of the solar radiation using deep subwavelength structures

    Nano Energy 70, 104553 (2020) (2015)
  • A. Prajapati, J. Llobet, M. Antunes, H. Fonseca, C. Calaza, J. Gaspar, G. Shalev
    An efficient and deterministic photon management using deep subwavelength features
    Nano Energy 70, 104521 (2020)
  • J. Llobet, M. Martins, C. Calaza, M. Antunes, S. Martins, H. Fonseca, B. Pires, J. Gaspar
    Automated characterization and analysis of fabricated large arrays of nanostructures on large area wafers
    Engineering 60, 320-325 (2019)
  • J. Llobet, G. Rius, A. Chuquitarqui, X. Borrise, R. Koops, MGA. van Veghel, F. Perez-Murano
    Arrays of suspended silicon nanowires defined by ion beam implantation: mechanical coupling and combination with CMOS technology
    Nanotechnology 29, 155303 (2018)