INL hosts intensive hands-on course on Micro-/Nanofabrication for Integrated Photonics

Earlier this year, INL welcomed industry professionals, researchers and students for two intensive one-week workshops on Micro-/Nanofabrication for Integrated Photonics, a training initiative supported by the NextChip programme, coordinated by the University of Vigo.

The workshops brought together 20 participants from leading institutions and companies across Spain, including the University of Vigo, AIMEN, Gradiant, and QuantaLux, for advanced training in nanofabrication processes for integrated photonic technologies. Participants praised the program for its relevance and depth, highlighting the value of hands-on experience in INL’s state-of-the-art cleanroom facilities.

Designed by Jana Nieder and Bruno Romeira, the course combined theory with practical modules on design, simulation, fabrication, and characterisation of photonic integrated circuits (PICs). Training was structured around three main demonstrator processes:

• Active PICs – including MicroLEDs and related nanofabrication techniques
• Passive PICs – from mask design to fabrication and optical characterisation
• Diffractive Optical Elements for PICs – leveraging nanoimprint technology

The course received contributions from several INLers, including Carlos Calaza and José Rodrigues on clean room processes and clean room general access, Diogo Aguiam and Patrícia Sousa on diffractive optical elements for PICs, from design to nanofabrication via nanoimprint technology, Tiago Magalhães and Artur Andrishak on 2D and 3D polymer PICs from finite-difference time-domain (FDTD) simulation to their fabrication and characterisation, Bruno Romeira and João Azevedo on active PICs, such as MicroLEDs, related design, simulation and nanofabrication and characterisation techniques, and Jérôme Borme on e-beam lithography and scanning electron microscopy (SEM).

Participants explored cutting-edge tools and workflows, including Lumerical simulations and Nazca design, e-beam lithography, direct laser writing, two-photon polymerisation, and nanoimprint fabrication, as well as integration techniques like wire bonding and characterisation using SEM, profilometry, and electro-optical measurements.

They expressed strong appreciation for the program, noting that the hands-on approach significantly enhanced their understanding of integrated photonics. Many highlighted that such practical training would have been invaluable at the start of their learning journey, as it clarified experimental challenges and opportunities and will make future, more advanced theoretical studies easier to grasp.

Pleased to receive such a positive outcome from the course, Nieder comments that she believes “the best way to learn is by doing! It is extremely helpful to receive an overview on which methods, protocols and tools to use for which design, and fabrication step of a photonics integrated device.”

The success of these workshops underscores INL’s commitment to advancing photonic technologies and fostering collaboration between academia and industry. This training was delivered twice under the NextChip Cathedra Chip project, and INL plans to offer similar schools in the future to strengthen skills and foster advanced technologies and innovation in this strategic field of energy-efficient integrated photonic technologies.

Interested in future training opportunities at INL? Stay tuned for upcoming announcements and join us in shaping the next generation of photonic technologies.